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https://doi.org/10.1049/el:19850614
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Cite Journal: Electronics Letters |  Publication Date: Sep 12, 1985 |
 Citations: 1 |
Affiliation: Philips (Germany)
Using a simple model for the PCVD process, we have calculated deposition profiles for different experimental conditions. Theory and experiment show that geometric taper lengths increase with the total gas flow and that they can be reduced by a factor of five by using optimised velocity ramps for the moving plasma zone.
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