Abstract
In this paper we provide results and discussion on the positive impact of ionizer(s) used in multiple configurations on wafer back-side and front-side particle adders in PVD processing tools. We present a hypothesis, followed by testing, that establishes a relationship between electrical surface charge collection data and particle data obtained in a laboratory setting and real world fabrication facility (fab) environment. For chip manufacturers, controlling surface charges on production wafers results in a reduced number of undesirable particles, thereby resulting in higher yield, more reliable final product chips, and reduced product losses. And for equipment manufacturers, more reliable and better tool performance can lead to increased customer satisfaction. The INOVA <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">®</sup> PVD system's good particle performance, as demonstrated on good quality wafers, is made more robust with an ionizer installation when marginal quality wafers are used.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
