Rectangular multilayer dielectric gratings with broadband high diffraction efficiency and enhanced laser damage resistance.

Abstract

Broadband multilayer dielectric gratings (MDGs) with rectangular HfO2 grating profile were realized for the first time using a novel fabrication process that combines laser interference lithography, nanoimprint, atomic layer deposition and reactive ion-beam etching. The laser-induced damage initiating at the grating ridge was mitigated for two reasons. First, the rectangular grating profile exhibits the minimum electric-field intensity (EFI) enhancement inside the grating pillar compared to other trapezoidal profiles. Second, our etching process did not create nano-absorbing defects at the edge of the HfO2 grating where the peak EFI locates, which is unavoidable in traditional fabrication process. The fabricated MDGs showed a high laser induced damage threshold of 0.59J/cm2 for a Ti-sapphire laser with pulse width of 40 fs and an excellent broadband diffraction spectrum with 95% efficiency over 150 nm in TE polarization.