Abstract
This work focuses on recent developments of plasma spray processes with respect to specific demands in energy technology. High Velocity Atmospheric Plasma Spraying (HV-APS) is a novel variant of plasma spraying devoted to materials which are prone to oxidation or decomposition. It is shown how this process can be used for metallic bondcoats in thermal barrier coating systems. Furthermore, Suspension Plasma Spraying (SPS) is a new method to process submicron-sized feedstock powders which are not sufficiently flowable to feed them in dry state. SPS is presently promoted by the development of novel torch concepts with axial feedstock injection. An example for a columnar structured double layer thermal barrier coating is given. Finally, Plasma Spray-Physical Vapor Deposition (PS-PVD) is a novel technology operating in controlled atmosphere at low pressure and high plasma power. At such condition, vaporization even of high-melting oxide ceramics is possible enabling the formation of columnar structured, strain tolerant coatings with low thermal conductivity. Applying different conditions, the deposition is still dominated by liquid splats. Such process is termed Low Pressure Plasma Spraying-Thin Film (LPPS-TF). Two examples of applications are gas-tight and highly ionic and electronic conductive electrolyte and membrane layers which were deposited on porous metallic substrates.
Highlights
Material development covers material synthesis on the one hand and processing techniques on the other hand
Summary and conclusions In this work, recent developments of plasma spraying techniques are described with respect to specific demands in energy technology
Three processes and some typical applications are given as examples
Summary
Recent developments in plasma spray processes for applications in energy technology This content has been downloaded from IOPscience. Please scroll down to see the full text. 181 012001 (http://iopscience.iop.org/1757-899X/181/1/012001) View the table of contents for this issue, or go to the journal homepage for more. Download details: IP Address: 134.94.122.142 This content was downloaded on 11/05/2017 at 13:18 Please note that terms and conditions apply. Yoshida Thermal Spray Coating of Tungsten for Tokamak Device Jiang Xianliang, F Gitzhofer and M I Boulos.
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