Abstract
Developments and advances in the e-beam lithography (EBL) made it possible to reach resolutions in a single digit nanometer range in the soft x-ray microscopy using Fresnel Zone Plates (FZP). However, it is very difficult to fabricate efficient FZPs for hard x-rays via this conventional fabrication technique due to limitations in the achievable aspect ratios. Here, we demonstrate the use of alternative fabrication techniques that depend on utilization of atomic layer deposition and focused ion beam processing to deliver FZPs that are efficient for the hard X-ray range.
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