Abstract
HCl measurements in a cleanroom environment are carried out using a cavity ring-down analyser in order to get an estimate of the HCl concentrations that can be expected to be present in semiconductor manufacturing. HCl is a reactive gas and the materials used for gas sampling and transportation have a significant effect on the measurement response time; hence, data on HCl adsorption to different materials is also provided. Finally, a light source operating at 1742 nm that can be used for HCl detection in a multi-gas analyser based on multipass photo-acoustic spectroscopy is presented. Preliminary results indicate that sub-ppb detection levels are achievable using this approach even for HCl.
Highlights
The presence of airborne molecular contaminants (AMCs) such as HCl, NH3 and HF is a key factor affecting production yields in the cleanrooms of the semiconductor industry [1,2,3]
HCl measurements in a cleanroom environment are carried out using a cavity ring-down analyser in order to get an estimate of the HCl concentrations that can be expected to be present in semiconductor manufacturing
A light source operating at 1742 nm that can be used for HCl detection in a multi-gas analyser based on multipass photo-acoustic spectroscopy is presented
Summary
The presence of airborne molecular contaminants (AMCs) such as HCl, NH3 and HF is a key factor affecting production yields in the cleanrooms of the semiconductor industry [1,2,3]. These results can be used to choose construction materials for the measurement system in order to optimise the response time in HCl sensing, which, along with sensitivity, is a crucial parameter for the real-time monitoring of reactive gases such as HCl, NH3 and HF.
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