Abstract
A thin-film deposition monitor is described that employs a windowless reflective Si photodetector as the sensing element. When the detector is illuminated by a monochromatic light beam at oblique incidence, the generated photoelectric signal becomes a sensitive function of the thickness and refractive index of the deposited film. For high sensitivity, the incident light is linearly polarized perpendicular to the plane of incidence, and an angle of incidence ≳60° is used. Further, the passivation SiO2 layer thickness is also judiciously selected for this application. A sensor of this kind is employed to follow the adsorption/desorption kinetics of an H2O film at the detector surface (at 633 nm wavelength) and the results are interpreted with the help of Bruggeman’s effective medium theory.
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