Reactivity of SiCl and SiF groups in SiO 2 glass with mobile interstitial O 2 and H 2O molecules

Abstract

Reactions of common network-bound halogens in synthetic SiO 2 glass, SiCl and SiF groups, with interstitial O 2 and H 2O molecules incorporated by thermally annealing were studied. It was found that the chemical properties are distinctly different between SiCl and SiF groups. SiCl groups react with interstitial O 2 and H 2O to form interstitial Cl 2 and HCl, respectively. In contrast, formation of interstitial F 2 and HF due to the reaction of SiF groups with interstitial O 2 and H 2O is not observed. The reactivity of SiCl and SiF groups is in accord with the properties and thermodynamic data of their respective analogous compounds, SiCl 4 and SiF 4.