Abstract

Time decay of photoluminescence due to interstitial oxygen molecules (O2) in synthetic amorphous SiO2(a-SiO2) was studied by varying the fictive temperature and the concentrations of common dopants (SiOH, SiCl, and SiF groups). The decay constant is insensitive to the fictive temperature, but strongly depends on the type of dopants: it is reduced by the nonradiative decay via an energy transfer from O2 to the vibrational modes of the dopants. The increases in the nonradiative decay rate due to SiOH, SiF, and SiCl groups are strong, slight, and negligible, respectively, which correlates with their vibrational energies. The quantum yield decreases by ∼20% as the SiOH content increases from 1017 to 1020cm−3. The deviation from the single exponential decay is due to the shape variation in the a-SiO2 network cages that surround O2, and to the distance distribution between O2 and SiOH groups.

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