Abstract
The tantalum pentoxide (Ta2O5) thin films used as protonic conductive solid electrolyte layers (SELs) in all thin film electrochromic devices (ATF-ECDs) were widely investigated. The working pressure played a great role in the microstructure and proton transfer of the Ta2O5 thin films. The Ta2O5 thin films were deposited by direct current (DC) reactive magnetron sputtering at different working pressures and growth mechanism was studied. The optical properties, structural properties, chemical compositions, morphologies and protonic conductive properties of the Ta2O5 thin films were systematically investigated. Moreover, the electrochromic properties for corresponding ATF-ECDs with Ta2O5 SELs were studied as well. The ATF-ECD with a 2.0 Pa Ta2O5 SEL exhibited the best device performance with high optical modulation and fast switch speeds.
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