Abstract
In this paper an original numerical model, based on the standard Berg model, was used to simulate the growth mechanism of NiCrxOy deposited with changing oxygen flow during reactive sputter deposition. The effect of oxygen flow rate on the discharge voltage, deposition rate and the material elementary composition were investigated. The ratio of Ni and Cr content in the film was measured using energy-dispersive X-ray spectroscopy (EDX). EDX detected a decrease in the Cr concentration with the increasing of oxygen flow rate due to the preferential oxidation of Cr to Cr2O3. Results show a reasonable agreement between numerical and experimental data.DOI: http://dx.doi.org/10.5755/j01.ms.22.2.8563
Highlights
Nickel oxide and chromium oxides are frequently used in fields requiring a strong absorption in the visible range like electrochromic coatings and solar selective absorbers [1 – 2]
We present a model that enables us to predict film composition of NiCrxOy prepared by reactive sputtering
We report NiCrxOy thin films deposited by magnetron sputtering method with different oxygen flows and investigate the changing fraction of Ni and Cr with respect to the oxygen flow using energy-dispersive X-ray spectroscopy (EDX) analysis
Summary
Nickel oxide and chromium oxides are frequently used in fields requiring a strong absorption in the visible range like electrochromic coatings and solar selective absorbers [1 – 2]. G. smart windows, glare free and variable reflectance mirror and gas sensors [3 – 4] Besides these applications, new technologies based on renewable energies, and in particular of solar energy, are undergoing a fast development. We present a model that enables us to predict film composition of NiCrxOy prepared by reactive sputtering. It is assumed that the gettering of reactive gas onto metal nickel and chromium contributes the formation of NiO and Cr2O3 on the target respectively, which will increase θt[2] or θt[4], respectively. For the metal Ni sputtered from the target, if the atom comes from the fraction of θt[1] and deposits on the substrate surface which previously consisted of NiO, the fraction of Ni will increase and the fraction of the other compositions will decrease. At deposited onto the fraction θsi of the collecting area As will not change the value of θsi
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