Abstract
High rate sputtering has become important in almost all fields of modern high vacuum coating technology. The first wide application of high rate sputtering was the metallization of semiconductor devices. A newer application of growing importance is the deposition of oxide films in the field of architectural coatings for solar control films or heat mirrors, as well as in the field of optical coatings. The high rate sputtering process for the deposition of oxide films, namely TiO 2, SnO 2, Ta 2O 5 and WO 3, is described and optical properties of the films are discussed. A special mechanism for optimizing the deposition rate when using mixtures of argon, oxygen and nitrogen as the sputtering gas is presented. In particular, with nitrogen the achievable sputter rate can be increased by a factor of 2–3 with respect to that for nitrogen-free atmospheres, depending on the material sputtered.
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