Abstract
TiN, ZrN and HfN films were deposited by the arc vapor ion deposition process onto polished flat M2 steel substrates to study the composition, morphology, crystal orientation, surface roughness, critical load and microhardness of the films. The deposition variables explored were the nitrogen pressure and the substrate bias voltage. Preferential orientation and changes in microstructure have been observed by X-ray diffraction analysis and correlated with changes in the deposition parameters of pressure and substrate bias voltage. The (111) orientation is shown to predominate in the TiN and ZrN films, while the HfN crystal orientation varied widely with parameter changes. The changes in orientation reflected composition variation measured by wavelength dispersive X-ray analysis. Scratch test results show that lower critical loads vary inversely with microhardness.
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