Abstract
The desorption kinetics of chlorine adsorbed on Si(111)7 × 7 were studied using molecular beam scattering (MBS) and temperature programmed desorption (TPD) with a chlorine molecular beam. The desorption of SiCl and SiCl 2 was observed in the MBS experiments. Most of the desorption products were SiCl 2. The intensity of the SiCl desorption remarkably increased with sample temperature above 800°C. The SiCl 2 desorption above 600°C was attributed to the recombinative reaction of SiCl, which has second-order kinetics. The SiCl 2 desorption at 450°C was found in both MBS and TPD experiments. This desorption was observed only when chlorine interacts with the adatoms of the 7 × 7 structure on the Si(111) surface and TPD studies of this desorption revealed first-order reaction kinetics. Desorption at 450°C was attributed to direct desorption of the SiCl 2, which was formed on the adatom.
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