Abstract
Reflectance difference spectroscopy was measured in the metal organic chemical vapor deposition reactor and also in UHV at 20 K. It revealed a characteristic negative peak at the low energy side that was indicative of the specific surface reconstruction. This peak disappeared completely if the sample was kept within a narrow intermediate temperature range. At 20 K the negative peak appeared at 2.4 eV for the Ga-terminated (2×4)-reconstructed surface and at 2.6 eV for the P-terminated (2×1)/(2×2)-reconstructed surface. RDS for the two different surface reconstructions displayed strong structures also in the range of the bulk transitions. A characteristic zig-zag pattern was observed in the STM image of the P-terminated surface.
Published Version
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