Abstract
Rutherford backscattering spectrometry (RBS) has been used to characterize thin films of yttrium and erbium arachidate deposited on a silicon substrate by a Langmuir-Blodgett technique. RBS can measure film thickness as well as the stoichiometry. Beam effects do not influence these results at moderate beam currents and fluences, although the film's visual appearance was very sensitive to beam exposure. Beam-induced hydrogen desorption is also expected, and evidence for this is presented at high doses. RBS has also been used to characterize LB films during thermal decomposition and to analyze the metal-oxide end products (Y 2O 3 and Er 2O 3 films). An example is also given where a mixed YBaCu-oxide film is deposited by this method.
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