Abstract
In this paper, a new fabrication method for an ordered nano-dot array is developed. Combination of coating, nano-plastic forming and annealing processes is studied to produce uniformly sized and ordered gold nano-dot array on a quartz glass substrate. The experimental results reveal that patterning of a groove grid on the gold-coated substrate with NPF is effective to obtain the ordered gold nano-dot array. In the proposed fabrication process, the size of the gold nano-dot can be controlled by adjusting the groove grid size. A minimum gold nano-dot array fabricated on a quartz-glass substrate was 93 nm in diameter and 100 nm in pitch. Furthermore, the mechanism of nano-dot array generation by the presented process is investigated. Using a theoretical model it is revealed that the proposed method is capable of fabrication of smaller nano-dots than 10 nm by controlling process conditions adequately.
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