Rapid and low-temperature preparation of tungsten oxide electrochromic thin films by oxygen plasma treatment

Abstract

Electrochromic materials have attracted considerable attention due to their ability to change color reversibly and rapidly under an external electrical stimulus, making them highly promising for use in various applications such as smart windows, displays, and optical memory devices. In particular, tungsten trioxide (WO3) thin films have shown excellent electrochromic properties, leading to their wide application in electrochromic devices. In this study, oxygen plasma treatment was used to convert WCl6 thin film to WO3 electrochromic thin film on ITO glass substrate. Surface morphology, element composition, phase, optical property, and electrochromic characteristics of WO3 film are analyzed. It has been proved that the conversion of precursor films is rapid and efficient, the mean roughness and root mean square of amorphous WO3 thin film are lower than 1.8 nm and 2.2 nm respectively, and the film exhibits good electrochromic performance parameters. The optical modulation range and coloration efficiency of the film can reach 58.5% and 80.2 cm2/C before cycle and 56.3% and 84.0 cm2/C after 100 cycles, coloration time and bleaching time are within 10 s. The method of plasma treatment avoids annealing and prepare WO3 film with good and stable performance. This method has the potential to expand to other electrochromic materials, and provides a new solution for the large area preparation and flexible application of electrochromic materials.