Abstract

In recent years, high-electron-mobility GaN HEMTs have demonstrated significant advancements in applications such as power converters and RF amplifiers. Nevertheless, their thermal reliability poses a notable challenge, placing constraints on their power-handling capacities. This study employs micro-Raman spectroscopy to evaluate the localized self-heating-induced channel temperature. The channel temperature, determined using the single phonon modes of GaN HEMT (E2(H) & A1(LO)), exhibits discrepancies and does not align with device temperature values calculated using the SiC phonon peak near the GaN channel. However, by employing both phonon modes of GaN to decouple the combined effects of joule heating and the thermoelastic effect, accurate channel temperature values are obtained, matching well with those obtained from the SiC phonon peak. The agreement between calculated temperatures from phonon modes and those obtained by heating the device from the back side enhances the credibility of the proposed method.

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