Abstract
This paper reviews the background to glow-discharge sputter deposition of thin films and the deposition of YBCO superconducting thin films in particular. The background to sputtering is briefly reviewed with reference to the recent literature on analytical and numerical techniques for investigating radiofrequency (r.f.) plasmas, magnetron sputtering and hysteretic behaviour in reactive sputtering. Low-energy, ion-assisted deposition techniques are briefly reviewed, and the effect of ion-beam interactions on film nucleation and growth is also discussed. The background to the sputter deposition of high-temperature superconductors (HTS) is given along with the choice of sputtering system for HTS deposition. Resputtering effects, off-axis andin-situ/ex-situ processing are also discussed. The sputter deposition of YBa2Cu3O x is considered in detail along with theP-T-x oxidation conditions and the tetragonal/orthorhombic line. Typical experimental arrangements and results for YBCO sputtered onto SrTiO3 and MgO are given. The problem of producing high-critical-current-density polycrystalline films by sputtering is also discussed.
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