Abstract
The aim of this paper is to demonstrate a novel, radial confinement approach to improve the breakdown performance of a lateral power device. The key feature is that the drift region width decreases gradually from the anode to the cathode to achieve charge confinement in the radial direction. As a result, the n− drift region concentration can be increased by a factor of 7 in comparison to a conventional counterpart leading to a lower specific on-state resistance. This technique is applicable to silicon-on-insulator technologies, such as the SOI or SOS, and to high-voltage thin-film transistor technologies on glass. Experimental results from radial diodes fabricated in SOS technology show a blocking capability higher than from those of their conventional counterparts.
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