Quasiballistic transport in nanometer Si metal-oxide-semiconductor field-effect transistors: Experimental and Monte Carlo analysis

Abstract

Room temperature electron mobility (μ) in nanometer Si metal-oxide-semiconductor field-effect transistors (MOSFETs) with gate length (LG) down to 30 nm was determined by the magnetoresistance method. A decrease of μ with the decrease of LG was observed. Monte Carlo simulations of electron transport in nanometer MOSFETs were carried out for realistic devices as a function of LG. The dependence with LG and electron concentration of simulated mobility and transmission coefficient agree with experimental data. An analysis of scattering events and time of flight gives evidence of the presence of ballistic motion in the investigated structures and proves its influence on mobility degradation in short transistors. The results give arguments that interpretation of the magnetoresistance coefficient as the square of the mobility is valid also in the case of quasiballistic electron transport.