Abstract
An approach for measuring the surface profile of the samples with reflection variations using the Nomarski differential interference method is presented. The system is analyzed with Jones's matrices tool, and polarization effects of a non-polarizing beam splitter are taken into account. Equations are also developed to allow the determination of the surface profile from interference intensity when the sample reflectively is not uniform. The validity and accuracy of the measurement are verified by measuring the adhered silicon cantilever on a substrate with high reflectivity. This method is expected to be a valuable tool to inspect elements of micromechanics and microsystems.
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