Abstract
This paper describes a model which quantitatively evaluates the Auger sputter profiles of thin surface layers, whose thickness is similar to the inelastic mean free path of the Auger electrons. In the model, the intensity of an Auger signal is taken as the sum of the signals from each atomic layer, the signal from any one layer being the product of a relative sensitivity factor, an absorption coefficient related to the mean free path of the particular Auger electron, and the elemental concentration in the layer. The statistical nature of the sputtering process is also incorporated in the form of a modified Poisson distribution. Comparisons between the experimental data and predictions from the model are shown for a number of surface layers, i.e., oxide films on Fe and Ni, the electropolish film on Fe-26Cr, and an Fe film electrodeposited onto Ni.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
