Abstract
Kelvin probe force microscopy (KPFM) is a widely used technique to map surface potentials at the nanometer scale. In traditional KPFM, a feedback loop regulates the DC bias applied between a sharp conductive probe and a sample to nullify the electrostatic force (closed-loop operation). In comparison, open-loop techniques such as dual harmonic KPFM (DH-KPFM) are simpler to implement, are less sensitive to artefacts, offer the unique ability to probe voltage sensitive materials, and operate in liquid environments. Here, we directly compare the two techniques in terms of their bandwidth and sensitivity to instrumentation artefacts. Furthermore, we introduce a new correction for traditional KPFM termed "setpoint correction," which allows us to obtain agreement between open and closed-loop techniques within 1%. Quantitative validation of DH-KPFM may lead to a wider adoption of open-loop KPFM techniques by the scanning probe community.
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