Abstract

The quantitative measurement of a crystal bending effect is performed using low-order zone-axis convergent beam electron diffraction (CBED) patterns. Although the accuracy of the present method is inferior to that of the method of using split higher order Laue zone lines, this method enables us to estimate the crystal bending effect at a region very close to the interface and to easily judge whether the crystal bending effect results in a tensile bend or a compressive bend. As an application of the present method, the crystal bending effect at a region close to the SiGe/Si interface was measured. It was found that the crystal bending effect is due to a thin-foil relaxation of almost 0.3 degrees at a region that is approximately 10 nm away from the interface.

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