Abstract
Quantitative analysis of trace amount of water at the ppb level or less in monosilane gas was conducted using an atmospheric-pressure ionization mass spectrometer with a bicompartment ion source which prevents Si compound deposition in the ion source. Water ion which is not detected in the usual form of H2O+ due to the lower ionization potential of SiH3+ than that of H2O+, was detected as cluster ions (SiH3OH2)+, (SiH3OH2H2O)+, (Si2H5OH2)+ and (Si2H5OH2H2O)+. These ions were identified by the collision-induced dissociation method. The intensity of each of these ions changed with monosilane concentration. An independent calibration curve of monosilane concentration was obtained from the total intensity of these ions. In this raw monosilane gas, about 20 ppb of water was detected. This was decreased to 2.5 ppb upon using an adsorption-type purifier. The detection limit (S/N) was estimated to be 5 ppt.
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