Quality assessment of antisticking layers for thermal nanoimprint

Abstract

Layers from fluorinated trichlorosilanes are in widespread use for the prevention of sticking in nanoimprint. It is generally assumed that these layers are monolayers, bonded to the substrate, and internally cross-linked. The authors have investigated a gas phase deposition process for such layers in detail, varying the amount of antisticking agent and the deposition time in a vacuum process. The quality of the layers was determined from the layer thickness and the contact angle was measured. In accordance with some recent literature, claiming that formation of dense cross-linked monolayers from fluorocarbon-trichlorosilanes is not possible, the results indicate that the deposited layers are not monolayers. Instead the authors suggest that they are even thinner disordered but cross-linked layers. Obviously monolayer formation is not required for sticking prevention.