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Abstract
A vapor-phase decomposition mechanism for the trimethylaluminum(TMA) used in an Al CVD was investigated by infrared spectroscopy. In pyrolysis, the annihilation of TMA was a first-order reaction and a CH3 radical was generated. The activation energy of the annihilation was about 0.4 eV. The generation mechanism of CH4 from the intermediates was investigated quantitatively. It is suggested that carbon contamination can be reduced by using an H2 carrier gas since the CH3 radical which causes such contamination is changed into CH4 by hydrogenation. In photolysis, the annihilation of TMA is a first-order reaction and C2H6 is generated by the coupling of two CH3 groups. The reduction of carbon contamination is also suggested because the generation of a CH3 radical is suppressed by the generation of C2H6.
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