Abstract
Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4-3.1 nm are presented. The theoretical efficiency of multilayer optics is compared for different wavelengths. Keywords: X-ray lithography, multilayer X-ray optics, multilayer X-ray mirrors.
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