Interface smoothing of soft x-ray Mo/Y multilayer mirror by thermal treatment

Abstract

A systematic study of structure and thermal stability of a [(Mo/Y/) x 5] soft x-ray multilayer (ML) mirror prepared by electron beam evaporation system has been performed by means of x-ray reflectivity (XRR) and grazing incidence x-ray diffraction (GIXRD). The GIXRD patterns show that the Mo and Y layers are polycrystalline in nature. The obtained XRR patterns confirm the very good quality of the ML stack. Isochronal thermal annealing up to the temperature of 400 °C leads to a decrease in interface roughness which in turn results in sharpening of the ML interfaces. Further elevating the annealing temperature above 400 °C oxidizes the Y layers and the interface roughness increases. Thus increase in interface roughness beyond this temperature can be understood in terms of evolution of yttrium oxide, which significantly affects the ML structural properties. The modulation structure is well maintained even after annealing at 600 °C, which confirms very good thermal stability of the Mo/Y ML mirror. Our results demonstrate that low-temperature annealing (up to 400 °C) is an effective method to improve the quality of an as deposited Mo/Y soft x-ray ML mirror. Diffuse scattering measurements show very good correlation with the XRR fitting parameters.