Abstract
It is pointed out that the performance of superconducting storage ring synchrotron radiation sources designed for deep-etch lithography like the source KSSQ planned at Karlsruhe is much superior to that of typical thin film lithography sources and comes close to that of first and second generation synchrotron radiation sources. Therefore, the range of applications of such machines exceeds the original design goal by far and includes many of the important synchrotron radiation methods based on diffraction, absorption, and fluorescence excitation, as well as foreseeable production methods. Thus, these machines may become a new class of sources of their own.
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