Abstract
Undoped and simultaneously (Sn+F) doped ZnO thin films were fabricated using a simplified spray pyrolysis technique and the effects of Sn doping level on their electrical, structural, optical and surface morphological properties were studied. The XRD patterns confirmed the hexagonal wurtzite structure of ZnO. The minimum electrical resistivity of 0.45×10−2Ωcm was obtained for ZnO films having Sn+F doping levels of 8+20at%. All the films exhibited average optical transmittance of 85% in the visible region, suitable for transparent electrode applications. The overall quality of the fabricated films was confirmed from photoluminescence (PL) studies. The PL and surface morphological studies along with the elemental analysis showed the increase of Sn diffusion into the ZnO lattice which was consistent with the concentration of Sn in the starting solution. The results of the analysis of physical properties of simultaneously doped ZnO films proved that these films might be considered as promising candidates for solar cells and other opto-electronic applications.
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