Abstract
ZnO:Eu3+薄膜具有来自Eu3+的5DO→7F2跃迁产生的强而尖锐的红色特征峰,非常适合作为光电器件的发光材料。本文首先利用直流磁控溅射在普通载玻片上制备ZnO种子层,然后采用水热法在ZnO种子层上成功制备了ZnO:Eu3+薄膜,最后利用X射线衍射仪、光致发光(PL)光谱仪以及拉曼光谱仪对样品进行表征。XRD分析结果表明:ZnO:Eu3+薄膜具有六角纤锌矿结构,且沿(002)C轴择优取向生长,另外没有其它衍射峰的出现,掺杂后薄膜的结晶度降低。PL谱测量结果显示,在325 nm波长激发下,强的本征ZnO特征峰几乎完全被抑制,在615 nm附近呈现出Eu3+强而尖锐的红色特征峰,所以Eu3+成功取代Zn2+进入ZnO晶格。另外不同的掺杂比例,ZnO:Eu3+薄膜的主峰位置略微有一些偏移。通过掺杂前后的拉曼光谱对比分析发现掺杂后Eu3+取代Zn2+与O2−成键或者与Zn2+成键而产生新的拉曼峰。 ZnO:Eu3+ film shows a strong and sharp red character peak from the 5DO→7F2 transitions in Eu3+ ions, which would be very fit for luminescent material of photoelectric device. A ZnO seed layer is first prepared on a glass substrate by CS-300 DC magnetron sputtering device, and then Eu3+-doped ZnO thin films are assembled on the ZnO seed layer using a simple hydrothermal method. X-ray diffraction (XRD) spectrum, Photoluminescence (PL) spectrum and Raman scattering spectrum are used to characterize the ZnO:Eu3+ thin films at last. The XRD analysis results show that all ZnO:Eu3+ thin films have hexagonal wurtzite structure and along the (002) C-axis preferred orientation growth, beyond that there is no other diffraction peak in the diffraction spectrum, and crystallinity of thin films is decreased after doping with Eu3+. The PL spectrum results show that strong intrinsic ZnO characteristic peak was almost completely suppressed with the excitation of 325 nm ultraviolet photons, and a sharp and intense red characteristic peak located at around 615 nm wavelength in the visible region can be observed from the PL spectras of ZnO:Eu3+ thin film. So Eu3+ successfully substitutes Zn2+ in the ZnO lattice. In the different doping ratio, the highest peak of ZnO: Eu3 + film have some slight deviation. The Raman spectroscopy comparison of before and after doping analysis reveals that after Eu3+ substitutes Zn2+, bonding with O2− or Zn2+, new Raman peaks appear in the Raman spectra.
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