Properties of TiAl/TiAlN/TiAlCN Films Deposited by Arc Ion Plating on GCr15 Rings

Abstract

Ring is one of the major textile spinning machine consumable part, it has an important influence on yarn quality and cost. Ring of domestic cotton spinning enterprises generally has poor hardness, bad accuracy, not durable and difficult to guarantee the quality of the yarn, foreign ring has excellent performance, but it is too expensive, so it is difficult to widely used in China[1]. Vacuum arc ion plating technology has a wide range of applications in the aerospace, automobile, mold, tool, electronics and other fields [2-3]. TiN film which is prepared by arc ion plating technology has been widely used because of the TiN film has poor oxidation resistance and wear resistance at high temperatures, so the ternary films are developed on TiN film, such as TiAlN [4], TiCN etc. Traveller circle in the ring on the slide to produce large amounts of heat, it makes the ring surface temperature reach 400°C. When higher than 400°C, the TiCN film failure, therefore, ring should not be plated on the TiCN films. While TiAlN film oxidation temperature reaches 800°C. In HSS twist drill, depositing of TiAlN film can improve the service life more than four times [5]. Studies [6-8] have found that using pulsed laser deposition and chemical vapor deposition technique to prepare TiAlCN film, its wear resistance, high temperature stability is better. Pulsed laser deposition is mainly used in laboratory research. It is difficult to deposit a large area uniform film. Chemical vapor deposition of deposition rate is less than the arc ion plating, and produces lots of waste gas, leading to the environment is polluted. Arc ion plating technology can deposit the uniform films of large area with high deposition rate and deposition with no environmental pollution, therefore, this study, by means of vacuum arc ion plating technology to prepare high-precision, long-life and low-cost domestic cotton spinning ring. In order to obtain the best film process parameters, the performance of film is investigated at different bias and arc current.