Abstract
Tetrahedral amorphous carbon (ta-C) coatings have been prepared on silicon substrates by the pulsed cathodic arc source. For the limitation of the heat flux of the carbon plasma to the sample, the diaphragm of 27 mm diameter has been used. The deposition process has been carried out at three different distances between the arc source and the substrate: 150, 215 and 265 mm. The properties of ta-C coatings have been studied by Raman spectroscopy and dynamic nanoindentation techniques. The analysis of Raman spectra parameters has revealed that the concentration of ordered aromatic rings in Csp2 cluster decreases with distance between the arc source and the substrate while the concentration of chain groups increases. Nanoindentation has shown the decrease in nanohardness and Young’s modulus with the distance. Nanohardness value falls from 21 GPa to 16 GPa and Young’s modulus value goes down from 197 GPa to 177 GPa. So, it’s possible to control the formation of ta-C coatings structure by changing distance between the pulsed cathodic arc source and the substrate.
Published Version
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