Abstract

Niobium Oxide (Nb2O5) thin films were deposited on the glass substrates, using spray pyrolysis technique. During deposition the preparative parameters like nozzle to substrate distance, spray rate, concentration of the sprayed solution were kept constant at optimized values. The effect of substrate (deposition) temperature (varied between 250 to 450°C) and post annealing treatment (at temperature 500°C) on the structural, optical and electrical properties of thin films were studied. Using scanning electron microscopy and X-ray diffraction technique morphological and structural characterizations of the films were carried out. For optical and electrical properties of thin films, optical absorption and two probe electrical resistivity techniques were used. It has been observed that with increase in the substrate temperature films become micro or polycrystalline. Annealed films exhibit higher crystallinity. Other parameters like thickness, electrical resistivity and band gap energy value decrease with increase in substrate temperature.

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