Abstract
Carbon coating techniques based on plasma chemical vapour deposition (CVD) have been recently applied for first walls of fusion devices to reduce the erosion, and for compact disks to lengthen the lifetime. However, the properties of carbon films are strongly dependent on the preparation conditions. In order to obtain the relation between the preparation conditions and the film structure, in a plasma CVD apparatus several carbon films were prepared using different discharge parameters such as r.f. power and gas mixing rate. The physical properties of the films were examined in terms of crystal structure, chemical bonds, hardness, depth composition profile and hydrogen concentration. The structure of carbon films prepared at a total pressure of 1.3 Pa became amorphous, while the graphite-like structure was developed for the films produced at a lower total pressure or higher plasma space potential. When the structure became graphitic, the hydrogen concentration decreased from 40 to 5 at.%. In addition, the Knopp hardness was observed to increase from 80 to 500 kgf mm -2 as a result of the graphitization.
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