Abstract
Reactive d.c. plasmatron sputtering of Cd 2Sn targets in an ArO 2 gas mixture allows the production of cadmium stannate films. We found ranges of the discharge power and of the pressure ratio p O 2 p tot as coating parameters that yield highly transparent and electrically conductive films at a substrate temperature ϑ s of about 30°C. The deposition rates were greater than 6 nm s −1. The most important film properties measured at a constant discharge power P = 450 W as functions of the pressure ratio p O 2 p tot are given.
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