Abstract
The influence of the oxygen content Q in an Ar-O 2 gas flow on the deposition rate, the substrate temperature and the optical properties of iron oxide thin films prepared by the d.c. reactive sputtering of an iron target was investigated. The existence of a minimum oxygen content Q f is confirmed, below which the optical properties of the films obtained on static substrates do not fulfil the requirements of selectively transparent photomasks. Methods to determine Q f are proposed based on the variation of the discharge current and/or the deposition rate when Q reaches the value Q f. The effect of post-deposition annealing on the optical density of the films was also investigated.
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