Abstract
Silicon nitride films with a stoichiometric ratio of Si 3N 4 were synthesized by ion-beam- enhanced deposition (IBED). It was observed that a silicon nitride film formed by IBED is composed of a thin silicon-enriched top layer, a stoichiometric Si 3N 4 layer and a smooth transition layer at the interface next to the substrate. By detailed theoretical analysis and computer simulation of IR reflection interference spectra, refractive index profiles of the films were obtained. Composition profiles and refractive index profiles were correlated using the Lorentz-Lorenz equation. The fatigue and high temperature oxidation behaviour of metals can be improved using Si 3N 4 coatings made by means of IBED, and the mechanisms of these are discussed.
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