Abstract
Conjugate wave-front generation by degenerate four-wave mixing has been employed to project images with submicrometer features onto photoresist-coated substrates. The developed patterns demonstrate a resolution of >800 line pairs per millimeter for 413-nm illumination, consistent with theoretical expectations. The patterns are not degraded by speckle or edge enhancement, and the magnification is within 0.1% of unity. Focusing is accomplished by a novel interferometric procedure.
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