Projection maskless patterning for nanotechnology applications

Abstract

Projection maskless patterning (PMLP) is based on a programmable aperture plate system and on charged particle projection optics with 200× reduction, providing thousands of electron or ion (H+, He+, Ar+, Xe+, C60−) beams working in parallel on the substrate. As part of the European CHARPAN project a PMLP proof-of-concept tool has been realized. Using resolution templates, with 10keV H+ multibeams a resolution of 16nm lines and spaces was achieved in HSQ resist across the proof-of-concept tool 25×25μm2 exposure field at an exposure dose of 25μC∕cm2. Enhancing the dose by 10% there was <1nm increase in linewidth. With 10keV Ar+ multibeams resistless nanopatterning of various materials was accomplished. Inserting a wired programmable aperture plate system providing ∼4000 beams, first HSQ resist exposure and patterning results have been accomplished, implementing gray scale exposure techniques. The system is being upgraded to a PMLP engineering tool integrating an aperture plate system with complementary metal oxide semiconductor electronics providing ∼40000 programmable beams, a precursor gas injection system for in situ ion multibeam induced etching and deposition, and a laser-interferometer controlled high-precision vacuum stage. Industrial PMLP nanotechnology applications are discussed.