Abstract
Charged particle nanopatterning techniques based on electron and ion multibeam projection techniques are finding increased industrial interest for the fabrication of leading-edge complex masks, nanoimprint templates, and,—using maskless and resistless techniques,—for nanosystem device research and development. A proof-of-concept tool for ion projection multibeam nanopatterning has been realized. Inserting a programable aperture plate system with integrated 0.25μm complementary metal oxide semiconductor electronics, providing switchable beams of 2.5×2.5μm2 size, with 200× ion-optical reduction, 43 000 programmable beams of 12.5nm size were obtained, demonstrating 20nm resolution capability.
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