Abstract

In the realm of solar energy technology, exploring hafnium oxide (HfO2) in Tunnel Oxide Passivated Contact (TOPCon) solar cells is pivotal. This study delineates HfO2's evolution from semiconductor applications, highlighting its crucial role in enhancing TOPCon solar cell performance. Utilizing ATLAS Silvaco software, the study anticipates a 21.3% increase in charge carrier lifetime through optimized HfO2 layers, addressing challenges in interface engineering and scalability. Innovative research integrates hafnium oxide (HfO2) into TOPCon solar cells, marking a leap in photovoltaic technology. Utilizing ATLAS Silvaco simulations, it shows that HfO2 layers can significantly enhance cell performance, increasing charge carrier lifetime by 21.3% and potentially boosting efficiency by 25%. This underscores HfO2's advantages, like a higher dielectric constant and thermal stability, in improving solar cell efficiency and durability. Future efforts target refining deposition processes, projecting a 25% boost in overall power conversion efficiency (PCE). Emphasizing HfO2's significance in solar cell technology, this research contributes to global sustainable energy initiatives. Integrating HfO2 in TOPCon solar cells signifies a key achievement in harnessing clean, renewable energy. Upcoming research focuses on experimental validation, interface engineering, optimization, stability assessments, scalability, and collaborative studies, aiming to leverage HfO2's potential for elevating solar energy conversion technologies.

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