Production of Low Electron Temperature Plasma and Coating of Carbon-Related Water-Repellent Films on Plastic Plate

Abstract

Low electron temperature plasma with a value less than 2 eV was produced by the inductively coupled discharge with a three-turn spiral antenna and the radio-frequency-biased grid for hard coating of carbon-related water-repellent thin films on plastic plate. It was found that the electron temperature decreased with increasing a negative biasing voltage V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">G</sub> for V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">G</sub> <; -100 V and, then, electron population becomes bicomponent with the higher temperature of about 10 eV and the lower temperature of less than 2 eV. The water-repellent thin films were also prepared on polycarbonate and silicon wafer substrates in the low electron temperature plasma using C <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> H <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> F <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> and Ar mixture gases. The wetting contact angle and the pencil hardness were discussed.