Abstract

The technique of growing CdTe and Cdx Hg1 − x Te layers utilizing chemical metalloorganic compound vapor deposition (MOCVD) onto a CdZnTe(111) substrate with a preliminarily deposited Cd y Hg1 − y Te layer using liquid phase epitaxy (LPE) has been developed. No noticeable changes in the electrophysical parameters and composition of the Cd y Hg1 − y Te layer take place under such conditions during MOCVD deposition.

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