Abstract
We have developed a field-emission-type of cluster ion source using ionic liquids such as 1-butyl-3-methylimidazolium hexafluorophosphate (BMIM-PF6). The current obtained was stable by placing a porous cap around the emitter. Time-of-flight (TOF) measurement showed that the peak mass number was approximately 5000 for positive and negative BMIM-PF6 ion beams. This indicated that BMIM-PF6 clusters with a size of a few tens of molecules were produced. With regard to the surface modification by BMIM-PF6 ion beams, positive and negative cluster ion beams were used to irradiate Si(100) and glass substrates. Scanning electron microscope (SEM) and atomic force microscope (AFM) observations showed that the surface roughness of substrates increased. Furthermore, X-ray photoelectron spectroscopy (XPS) measurement showed that the composition ratio of layers deposited by positive or negative cluster ion beams was similar to that of BMIM-PF6 solvent.
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