Process optimization of parameterized single shot method for a rapid production of photon sireve with direct write lithography

Abstract

Photon sieves are promising elements for high-resolution optics. Fabrication of photon sieves is a raising topic of microscale optic fabrication. In order to fabricate photon sieves, many technics featured recently. Common production difficulties for fabrication are time consumption and complexity of process. This study provides direct write lithography process optimization for rapid and simple fabrication method. Using the direct write laser technology to pattern photoresist with parameterized single laser shot is the main idea of this study. Writing pattern with the parameterized single shot method gives good structures for photon sieves. Parameterized single shot method uses variable focus distance and modulation to write patterns with direct write lithography. Rapid patterning with better geometrical structures is the most important result of this study. In microscopic scale, geometrical results and time consumption are some drawbacks of continuous exposure laser method. It is inadequate for small structures such as photon sieves outermost pinholes. The main approach of this study is the optimization of the writing process for rapid and well-shaped production of smaller structures for photon sieves. The process optimization for Kloe direct write lithography system serves better structure for photon sieve pinhole than conventional writing methods.