Abstract
The process flow to integrate metallic nanostructures in surface micromachining processes is presented. The nanostructures are generated by evaporation of microstructured silicon grass with metal. The process flow is based on the lift-off of a thin amorphous silicon layer deposited using a CVD process. All steps feature a low temperature load beneath 120 °C and high compatibility with many materials as only well-established chemicals are used. As a result metallic nanostructures usable for optical applications can be generated as part of multilayered microsystems fabricated in surface micromachining.
Highlights
Silicon grass as a non-periodical needle-like microstructure shows high potential for numerous applications, such as controlling wetting behaviour of surfaces or for chip assembly [1, 2]
As described in [3], the silicon grass is typically etched into the bulk of a silicon wafer, which limits the position of the nanostructures in the microsystem and restricts the fabrication flow
The presented technology enables the integration of silicon grass with vapour deposited nanostructures at the point of interest and in an arbitrary position of a multi-layered microsystem; such as a free-standing membrane that features thermocouples and shall be used as a high efficient infrared absorber
Summary
Silicon grass as a non-periodical needle-like microstructure shows high potential for numerous applications, such as controlling wetting behaviour of surfaces or for chip assembly [1, 2]. The additional vapour deposition of metal results in nanostructured metallic needles on top of the microstructured silicon grass (see Fig. 1).
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